Optical device for use as bandwidth narrowing module of laser light source that is utilized for semiconductor lithography, has passage area with edge having structure such that inhomogeneities is controlled in expanding direction

摘要

The device (12) has a radiation expanding module (18) for expanding incoming light radiation (14) in an expanding direction (X) transverse to a propagation direction (Z). An aperture diaphragm (32) has a passage area (34) limited by an edge (36), where an edge of the passage area of the diaphragm residing in the expanding direction has a structure such that deflection induced inhomogeneities in intensity distribution of the light radiation is controlled in the expanding direction. The structure has a line deviating from a straight line, and the diaphragm is arranged in the expanding module.