Optical focal adjusting component for use in lighting system for projection exposure system of extreme UV microlithography, has reflector devices displaced with adjusting actuator for correcting use area within adjustment region

摘要

The component (5) has a set of reflector devices for guiding of grazing an incidence extreme UV (EUV) illumination light (3), where the reflector devices i.e. micro mirrors, are arranged such that the incident light illuminates a use area (F). The reflector devices are connected and actively displaced with an adjusting actuator for correcting the use area within an adjustment region. Each reflector device includes a set of reflector bars that are arranged next to each other. Openings for passage of the light lies between each reflector bars.