首页> 外国专利> SOLID-STATE IMAGING ELEMENT, IMAGING DEVICE, METHOD OF DRIVING SOLID-STATE IMAGING ELEMENT, AND METHOD OF MANUFACTURING SOLID-STATE IMAGING ELEMENT

SOLID-STATE IMAGING ELEMENT, IMAGING DEVICE, METHOD OF DRIVING SOLID-STATE IMAGING ELEMENT, AND METHOD OF MANUFACTURING SOLID-STATE IMAGING ELEMENT

机译:固态成像元件,成像设备,驱动固态成像元件的方法以及制造固态成像元件的方法

摘要

PROBLEM TO BE SOLVED: To provide a solid-state imaging element that reduces smears caused by leakage of electric charge generated on a surface of a photoelectric conversion element to a charge transfer portion.;SOLUTION: The solid-state imaging element 5 including a plurality of photoelectric conversion elements formed in a semiconductor substrate 56 and the charge transfer portion 53 for transferring electric charge generated by the respective photoelectric conversion elements is equipped with a charge discharge portion (n-type silicon substrate 56) provided below the respective photoelectric conversion element and discharging electric charges accumulated in charge storage portions 60 of the respective photoelectric conversion elements. The plurality of photoelectric conversion elements are divided into photoelectric conversion elements 51 and photoelectric conversion elements 52, and a height of a first potential barrier between a charge storage portion 60 of a photoelectric conversion element 51 and the charge discharge portion below the photoelectric conversion element 51 is lower than a height of a second potential barrier between a charge storage portion 60 of a photoelectric conversion element 52 and the charge discharge portion below the photoelectric conversion element 52.;COPYRIGHT: (C)2012,JPO&INPIT
机译:解决的问题:提供一种固态成像元件,该固态成像元件减少由光电转换元件的表面上产生的电荷向电荷转移部分的泄漏引起的污点。解决方案:固态成像元件5包括多个形成在半导体基板56中的光电转换元件和用于传输由各个光电转换元件产生的电荷的电荷传输部分53中的一个具有在各个光电转换元件下方设置的电荷放电部分(n型硅基板56),并且释放累积在各个光电转换元件的电荷存储部分60中的电荷。多个光电转换元件被分成光电转换元件51和光电转换元件52,以及光电转换元件51的电荷存储部分60和光电转换元件51下方的电荷放电部分之间的第一电势垒的高度。低于光电转换元件52的电荷存储部分60和光电转换元件52下方的电荷放电部分之间的第二势垒的高度。版权所有:(C)2012,JPO&INPIT

著录项

  • 公开/公告号JP2011211121A

    专利类型

  • 公开/公告日2011-10-20

    原文格式PDF

  • 申请/专利权人 FUJIFILM CORP;

    申请/专利号JP20100079908

  • 发明设计人 HAGIWARA TATSUYA;

    申请日2010-03-30

  • 分类号H01L27/148;H04N5/359;H04N5/372;

  • 国家 JP

  • 入库时间 2022-08-21 18:25:45

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号