NEW SULFONIUM SALT, POLYMER COMPOUND, METHOD FOR PRODUCING THE POLYMER COMPOUND, RESIST MATERIAL AND PATTERN-FORMING METHOD

摘要

PPROBLEM TO BE SOLVED: To provide a sulfonium salt which can be used as a resist material in the photolithography using high energy rays as a light source, a polymer compound, a resist material, and a pattern-forming method. PSOLUTION: The sulfonium salt is represented by formula (1) (wherein X and Y are groups having a polymerizable functional group; Z is a 1-33C divalent hydrocarbon group which may include a hetero atom; RSP1/SPis a 1-36C divalent hydrocarbon group which may include a hetero atom; and RSP2/SPand RSP3/SPare each a 1-30C monovalent hydrocarbon group which may include a hetero atom or RSP2/SPand RSP3/SPmay be linked with each other to form a ring together with the sulfur in the formula). PCOPYRIGHT: (C)2011,JPO&INPIT