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POSITIONAL DEVIATION MEASURING DEVICE, POSITIONAL DEVIATION MEASURING METHOD, AND POSITIONAL DEVIATION MEASURING PROGRAM

机译:位置偏差测量装置,位置偏差测量方法和位置偏差测量程序

摘要

PROBLEM TO BE SOLVED: To improve measurement accuracy of positional deviation based on correlation between respective patterns.;SOLUTION: This measuring method includes: a signal processing equivalent to operation for adding m-kinds (m is an integer satisfying an inequality: m≥M) of pieces of phase information for showing mutually nonparallel phase traveling directions to each of pattern signals corresponding to two N-dimensional patterns (N is an integer of 2 or larger) to be compared, and determining correlation between m-sets of pattern signals to which the same pieces of phase information are added; and a processing for determining positional deviation between patterns based on the m-sets of pieces of correlation phase information acquired by the signal processing.;COPYRIGHT: (C)2011,JPO&INPIT
机译:解决的问题:基于各个模式之间的相关性来提高位置偏差的测量精度;解决方案:该测量方法包括:信号处理,其等效于用于添加m种类的操作(m是满足不等式的整数:m≥ M )的相位信息,用于显示与要比较的两个N维图案(N为2或更大的整数)相对应的每个图案信号相互不平行的相位行进方向,并确定m个图案信号之间的相关性添加了相同的相位信息; ;版权;(C)2011,JPO&INPIT;以及基于信号处理获得的m组相关相位信息确定图案之间的位置偏差的处理。

著录项

  • 公开/公告号JP2011158383A

    专利类型

  • 公开/公告日2011-08-18

    原文格式PDF

  • 申请/专利权人 YAMATAKE CORP;

    申请/专利号JP20100021283

  • 发明设计人 TAWARA TETSUYA;

    申请日2010-02-02

  • 分类号G01B11/00;

  • 国家 JP

  • 入库时间 2022-08-21 18:25:26

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