POSITIONAL DEVIATION MEASURING DEVICE, POSITIONAL DEVIATION MEASURING METHOD, AND SCANNING ELECTRON MICROSCOPE USING POSITIONAL DEVIATION MEASURING DEVICE

摘要

PROBLEM TO BE SOLVED: To measure a positional deviation between patterns differing in height, formed by a plurality of different pattern formation processes, with high accuracy while keeping throughput.SOLUTION: A correspondence between a lens of an electronic optical system and a parameter of a beam deflector, and an angle of a beam incident upon a sample is recorded as data. On the basis of the data and information on the height of patterns, a positional deviation amount or an edge position correction amount is calculated, and on the basis of the correction amount and edge position information from an observation image, a true positional deviation amount is calculated.