PROBLEM TO BE SOLVED: To provide a defect estimation device and a defect estimation method for estimating a defect on a mask, the influence of the defect on a wafer and the degree of improvement by repair, and to provide an inspection device and an inspection method for facilitating a defect determination processing and for estimating a defect on a mask and the resultant influence on a wafer image.SOLUTION: The acquired mask data of the defect portion of mask inspection results 205 is sent to a simulated repair circuit 300 to be simulatedly repaired. The acquired mask data simulatedly repaired is returned to the mask inspection results 205 again and thereafter sent to a wafer transfer simulator 400 along with a reference image at the corresponding portion. Wafer transfer images estimated by the wafer transfer simulator 400 are sent to a comparing circuit 301 and, when it is determined that there is a defect, the coordinate and the wafer transfer image as a basis for the defect determination are stored as transfer image inspection results 206. The mask inspection results 205 and the transfer image inspection result 206 are sent to a review device 500.
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