首页> 外国专利> LUBRICANT COMPOSITION, LUBRICATING FILM FOR METAL SURFACE, FRICTION REDUCER FOR METAL SURFACE, MAGNETIC RECORDING MEDIUM, AND NOVEL POLYETHER COMPOUND

LUBRICANT COMPOSITION, LUBRICATING FILM FOR METAL SURFACE, FRICTION REDUCER FOR METAL SURFACE, MAGNETIC RECORDING MEDIUM, AND NOVEL POLYETHER COMPOUND

机译:润滑剂成分,金属表面的润滑膜,金属表面的摩擦减阻剂,磁记录介质和新型聚乙烯化合物

摘要

PPROBLEM TO BE SOLVED: To provide a lubricant composition which can demonstrate a lubricating effect which is excellent in various applications such as a magnetic recording medium or the like. PSOLUTION: The lubricant composition includes a polyether compound which has an alkylene oxide residue and a carbonic ester residue. The alkylene oxide residue contains at least one selected from the group consisting of an ethylene oxide residue, a propylene oxide residue, a polyethylene oxide residue, and a polypropylene oxide residue. The polyether compound is a compound shown by general formula (1) or the like. In the formula, RSP11/SPdenotes a 1-12C straight chain or branched alkyl group, and n11 denotes an integer of two or more and 100 or less. PCOPYRIGHT: (C)2011,JPO&INPIT
机译:<要解决的问题:提供一种润滑剂组合物,其可显示出在各种应用(例如磁记录介质等)中优异的润滑效果。

解决方案:润滑剂组合物包含具有烯化氧残基和碳酸酯残基的聚醚化合物。环氧烷残基包含选自环氧乙烷残基,环氧丙烷残基,聚环氧乙烷残基和聚环氧丙烷残基中的至少一种。聚醚化合物是通式(1)等所示的化合物。式中,R 11 表示1〜12C的直链或支链的烷基,n11表示2以上且100以下的整数。

版权:(C)2011,日本特许厅&INPIT

著录项

  • 公开/公告号JP2010254957A

    专利类型

  • 公开/公告日2010-11-11

    原文格式PDF

  • 申请/专利权人 FUJIFILM CORP;

    申请/专利号JP20100034302

  • 发明设计人 KOMURA KAZUFUMI;KOMORI KIN;

    申请日2010-02-19

  • 分类号C10M105/48;C10M107/34;C07C69/96;G11B5/71;G11B5/725;C10N30;C10N30/06;C10N40/02;C10N40/18;

  • 国家 JP

  • 入库时间 2022-08-21 18:24:35

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