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METHOD FOR REPLACING CULTURE GAS IN CULTURE CAPSULE AND CULTURE CAPSULE

机译:替换文化胶囊中的文化气体的方法及文化胶囊

摘要

PROBLEM TO BE SOLVED: To provide a method for controlling the evaporation of culture solution in a dish by dry air flow, eliminating water droplet generation caused by bubbling in a gas buffer solution to prevent the water droplet from scattering, and further improving moisture-retaining ability in the culture capsule.;SOLUTION: There is disclosed a method for replacing a culture gas, wherein a gas buffer solution 3 is positively evaporated by opening a mouth of a gas supplying tube close to the surface of the gas buffer solution and by blowing the culture gas upon introduction of a gas into the inner part of culture capsule 4 filled with a gas buffer solution at the bottom of the culture capsule, the humidity in the culture capsule is kept without generating water droplet scattering by bubbling to prevent the culture solution from evaporating. There is also disclosed a cell culture capsule, wherein a cover body that can tightly close the inner part of body is provided in the body that has a dish rack accommodatable special purpose dishes and its lower part is a gas buffer solution tank, a gas supplying tube is just proximally provided to the surface of the solution with 1 to 3 mm gap in between the surface of the gas buffer solution injected into the gas buffer solution tank and the opening mouth of the tube, and aseptic nonwoven fabric for keeping humidity is installed between the surface of buffer solution and the lower part of the dish rack.;COPYRIGHT: (C)2011,JPO&INPIT
机译:要解决的问题:提供一种通过干燥空气流控制培养皿中培养液蒸发的方法,消除由于在气体缓冲溶液中鼓泡而产生的水滴,从而防止水滴散布,并进一步改善保水率解决方案:公开了一种用于更换培养气体的方法,其中通过打开靠近气体缓冲溶液表面的供气管的嘴并吹气来使气体缓冲溶液3正蒸发。将气体引入到在培养容器底部填充有气体缓冲溶液的培养容器4的内部中加入培养气体后,通过鼓泡防止培养溶液的散布,从而保持培养容器内的湿度而不会产生水滴飞散。从蒸发。还公开了一种细胞培养胶囊,其中在具有可容纳特殊用途的碗碟架的主体中设置能够紧密地封闭主体内部的盖体,并且其下部是气体缓冲溶液罐,供气装置。仅在溶液表面的近端设置管,在注入到气体缓冲溶液罐的气体缓冲溶液的表面与管的开口之间具有1至3mm的间隙,并安装用于保持湿度的无菌无纺布。缓冲溶液的表面和碗架的下部之间。版权所有:(C)2011,JPO&INPIT

著录项

  • 公开/公告号JP2011130698A

    专利类型

  • 公开/公告日2011-07-07

    原文格式PDF

  • 申请/专利权人 AIRTECH JAPAN LTD;

    申请/专利号JP20090292301

  • 申请日2009-12-24

  • 分类号C12N1/00;C12M1/00;C12M1/04;

  • 国家 JP

  • 入库时间 2022-08-21 18:22:09

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