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Reflection source localization method, reflection source localization device, the device under test scratches determination method and the object to be inspected scratches determination device
Reflection source localization method, reflection source localization device, the device under test scratches determination method and the object to be inspected scratches determination device
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机译:反射源定位方法,反射源定位设备,被测设备划痕确定方法和被检查物体划痕确定设备
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摘要
PROBLEM TO BE SOLVED: To make determination of high reliability according to information that closely matches the actual state of a reflection source, by calculating the position of the reflection source from the distance over which a detected reflected echo propagates, using a method for determining flaws in the specimen by means of mode conversion tandem process.;SOLUTION: The position of the reflection source by which the detected reflected echo is reflected is specified from the propagation time calculated from the time elapsed from the transmission of an ultrasonic wave from a first oblique probe 41 to reception of the reflection echo by a second oblique probe 42 and the velocity of the ultrasonic wave, the distance h from the front surface to the bottom surface (back) of a rail 1 against which the transmitting and receiving probes 41 and 42 abut, and the positions of the transmitting and receiving probes 41 and 42.;COPYRIGHT: (C)2001,JPO
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