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Being production manner of the phase die diffraction grating and the amplitude die diffraction grating which are used for the production mannered

机译:作为用于生产的相模衍射光栅和振幅模衍射光栅的生产方式

摘要

PPROBLEM TO BE SOLVED: To provide manufacturing methods for an X-ray phase type diffraction grating and an X-ray amplitude type diffraction grating used for an X-ray Talbot interferometer. PSOLUTION: Both the diffraction gratings 11 and 12 are constituted by arranging metallic X-ray absorption parts 111 and 121 of 2 to 10 μm in width at equal intervals of 2 to 10 μm, and widths w1 and w2 and intervals g1 and g2 of the X-ray absorption parts 111 and 121 are equal between the X-ray phase type diffraction grating and X-ray amplitude type diffraction grating (w1=w1 and g1=g2). The phase type diffraction grating 11 is constituted to a thickness t1 of 1 to 5 μm and the amplitude type diffraction grating 12 is constituted to a thickness t2 of 25 to 100 μm. PCOPYRIGHT: (C)2006,JPO&NCIPI
机译:

要解决的问题:提供用于X射线Talbot干涉仪的X射线相位型衍射光栅和X射线振幅型衍射光栅的制造方法。

解决方案:衍射光栅11和12都是通过以2至10μm的等间隔布置宽度为2至10μm,宽度为w1和w2的金属X射线吸收部111和121而构成的。 X射线吸收部111、121的间隔g1,g2在X射线相位式衍射光栅与X射线振幅式衍射光栅之间相等(w1 = w1,g1 = g2)。相位型衍射光栅11的厚度t1为1〜5μm,振幅型衍射光栅12的厚度t2为25〜100μm。

版权:(C)2006,JPO&NCIPI

著录项

  • 公开/公告号JP4608679B2

    专利类型

  • 公开/公告日2011-01-12

    原文格式PDF

  • 申请/专利权人 財団法人新産業創造研究機構;

    申请/专利号JP20050076921

  • 发明设计人 服部 正;

    申请日2005-03-17

  • 分类号G02B5/18;G21K1/06;G01T7/00;

  • 国家 JP

  • 入库时间 2022-08-21 18:20:17

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