首页> 外国专利> Forming method for forming partition and spacer of electrophoretic display medium on substrate, and electrophoretic display medium formed by forming method of partition and spacer forming partition and spacer of electrophoretic display medium on substrate

Forming method for forming partition and spacer of electrophoretic display medium on substrate, and electrophoretic display medium formed by forming method of partition and spacer forming partition and spacer of electrophoretic display medium on substrate

机译:在基板上形成电泳显示介质的间隔物和间隔物的形成方法,以及通过在基板上形成电泳显示介质的间隔物和间隔物的间隔物和间隔物的形成方法而形成的电泳显示介质

摘要

In an electrophoretic medium (10), if there is a demand to lower the height of a partition (13) than that of a spacer (14), in order to make the difference in heights of the partition (13) and the spacer (14) more accurate, the partition (13) and the spacer (14) are formed on a first substrate (11) according to a method which includes a first resist application step where a first negative resist (31) is applied on the first substrate (11), a first exposure step where the first negative resist (31) is exposed to light through a first mask (140) having an aperture pattern (146) for exposing a pattern of the partition (13) to light, a second resist application step where a second negative resist (32) is applied on the first negative resist (31), a second exposure step where the second negative resist (32) and the first negative resist (31) are exposed to light through a second mask (150) having an aperture pattern (156) for exposing a pattern of the spacer (14) to light, and a development step where the first negative resist (31) and the second negative resist (32) are developed.
机译:在电泳介质(10)中,如果需要降低隔板(13)的高度而不是隔板(14)的高度,以使隔板(13)和隔板的高度差( (14)更准确地,根据包括第一抗蚀剂施加步骤的方法在第一基板(11)上形成分隔壁(13)和隔离物(14),其中在第一基板上施加第一负性抗蚀剂(31)。 (11),第一曝光步骤,其中第一负抗蚀剂(31)通过具有用于将分隔壁(13)的图案曝光的开口图案(146)的第一掩模(140)和第二抗蚀剂曝光。将第二负性抗蚀剂(32)施加在第一负性抗蚀剂(31)上的涂敷步骤,第二负性抗蚀剂(32)和第一负性抗蚀剂(31)通过第二掩模曝光的第二曝光步骤( 150)具有用于将间隔物(14)的图案曝光的光圈图案(156)和显影在该步骤中,显影第一负性抗蚀剂(31)和第二负性抗蚀剂(32)。

著录项

  • 公开/公告号JP4682767B2

    专利类型

  • 公开/公告日2011-05-11

    原文格式PDF

  • 申请/专利权人 ブラザー工業株式会社;

    申请/专利号JP20050273575

  • 发明设计人 村上 健一;

    申请日2005-09-21

  • 分类号G02F1/167;

  • 国家 JP

  • 入库时间 2022-08-21 18:20:03

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