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Process control and detection evolved using near-infrared spectral reflectance measurement
Process control and detection evolved using near-infrared spectral reflectance measurement
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机译:使用近红外光谱反射率测量实现过程控制和检测
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摘要
Embodiments described herein provide a method and apparatus for obtaining process information in a substrate manufacturing process using plasma. In one embodiment, a chamber is provided having one or more optical metrology modules that are positioned such that optical energy from the plasma process is detected at substantially orthogonal angles. Metrics derived from detected optical energy may be used for endpoint determination, substrate temperature, and monitoring of critical dimensions on the substrate.
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