首页> 外国专利> Optical information process for producing a storage medium for the master, optical information method of manufacturing a storage medium for stamper, stamper, optical information storage method for manufacturing a medium for molded substrate and an optical information storage medium for molded substrate

Optical information process for producing a storage medium for the master, optical information method of manufacturing a storage medium for stamper, stamper, optical information storage method for manufacturing a medium for molded substrate and an optical information storage medium for molded substrate

机译:用于制造母盘的存储介质的光学信息处理,用于制造压模的存储介质的光学信息方法,压模,用于制造模制基板的介质的光学信息存储方法以及用于模制基板的光学信息存储介质

摘要

PROBLEM TO BE SOLVED: To provide a manufacturing method of a master disk for an optical information storage medium capable of easily producing areas having different depths on one disk, and to provide a manufacturing method of a stamper for the optical information storage medium, the stamper, a manufacturing method of a molding substrate for the optical information storage medium, and the molding substrate for the optical information storage medium.;SOLUTION: A photoresist layer 12 is formed on the surface of a substrate 11 for a master disk, and the disk is exposed. When a resist pattern 15 is formed after the exposure, reactive ion etching is carried out to a part exposed by the resist pattern to the whole surface of a photoresist master set to form a pattern 17. In this case, a flat mask 18 is installed on a photoresist surface so as to prevent etching to a part to be shallowed in a shallow area (first level). In this state, etching is carried out to the depth of an area to be deepened (second level). Finally, the photoresist remaining on the surface of the substrate 11 for the master disk is removed. Thus, the optical information storage medium having areas of different depths is formed easily on one disk.;COPYRIGHT: (C)2007,JPO&INPIT
机译:解决的问题:提供一种用于光学信息存储介质的母盘的制造方法,该方法能够容易地在一个盘上产生具有不同深度的区域,并且提供一种用于光学信息存储介质的压模的制造方法。 ,用于光学信息存储介质的模制基板的制造方法以及用于光学信息存储介质的模制基板。;解决方案:在用于主盘的基板11和该盘的表面上形成光致抗蚀剂层12。被暴露。当在曝光之后形成抗蚀剂图案15时,对由抗蚀剂图案曝光的部分进行反应性离子蚀刻,该部分被曝光至光刻胶原版的整个表面以形成图案17。在这种情况下,安装平面掩模18。在光致抗蚀剂表面上形成一层以防止蚀刻到浅区域(第一层)中要变浅的部分。在这种状态下,进行蚀刻至要加深的区域的深度(第二级)。最后,去除残留在用于母盘的基板11的表面上的光致抗蚀剂。因此,具有不同深度的区域的光学信息存储介质很容易形成在一个磁盘上。;版权所有:(C)2007,JPO&INPIT

著录项

  • 公开/公告号JP4668666B2

    专利类型

  • 公开/公告日2011-04-13

    原文格式PDF

  • 申请/专利权人 株式会社リコー;

    申请/专利号JP20050114956

  • 发明设计人 橋口 強;

    申请日2005-04-12

  • 分类号G11B7/26;

  • 国家 JP

  • 入库时间 2022-08-21 18:18:41

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