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Photocatalytic coating material and a method of manufacturing the same, and pollutant-containing product purification method and pollutant-containing product purification system using the photocatalyst coating material

机译:光催化涂料及​​其制造方法,以及使用该光催化剂涂料的含污染物的产品净化方法和含污染物的产品净化系统

摘要

PROBLEM TO BE SOLVED: To provide a photocatalyst coated material excellent in both photocatalytic property and durability and the manufacturing method and to provide a contaminant-containing material cleaning method by the photocatalyst, which is practically suitable in the view point of the durability without generating the stripping of a photocatalyst film and capable of effectively decomposing and removing the contaminant by the use of the photocatalyst coated material and the contaminant-containing material purifying device by the photocatalyst. SOLUTION: The photocatalyst coated material is structured by forming the photocatalyst film containing =90 vol.% anatase type and/or rutile type titanium oxide crystal on a titanium based alloy base material, the titanium base alloy base material contains =70 mass % titanium, the thickness of the photocatalyst film is =0.1 m and exists between the titanium base alloy base material and the photocatalyst and the thickness of an inevitable thin film different from the titanium oxide crystal or the titanium base alloy crystal is =0.05 m.
机译:要解决的问题:提供在光催化性能和耐久性方面均优异的光催化剂涂覆材料和制造方法,并提供通过该光催化剂进行的含污染物材料的清洁方法,从耐久性的角度来看,该方法实际上是合适的,而不会产生污染物。通过使用光催化剂涂覆的材料和通过光催化剂的含污染物的材料纯化装置,能够剥离光催化剂膜并且能够有效地分解和去除污染物。解决方案:通过在钛基合金基材上形成包含> 90%(体积)锐钛矿型和/或金红石型氧化钛晶体的光催化剂膜来构成光催化剂涂层材料,钛基合金基材的含量> 70%(质量)钛,光催化剂膜的厚度> = 0.1 m,并且存在于钛基合金基底材料和光催化剂之间,并且与氧化钛晶体或钛基合金晶体不同的不可避免的薄膜的厚度<= 0.05 m 。

著录项

  • 公开/公告号JP4689809B2

    专利类型

  • 公开/公告日2011-05-25

    原文格式PDF

  • 申请/专利权人 株式会社神戸製鋼所;

    申请/专利号JP20000305917

  • 发明设计人 安永 龍哉;佐藤 俊樹;

    申请日2000-10-05

  • 分类号B01J35/02;A61L9;A61L9/20;B01D53/86;B01J21/06;B01J23/745;B01J32;B01J37/02;B01J37/14;B09B3;C02F1/32;C02F1/72;F24F7/06;

  • 国家 JP

  • 入库时间 2022-08-21 18:18:41

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