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The process which forms the higher stratum of society film which includes

机译:形成社会电影更高层次的过程,其中包括

摘要

PPROBLEM TO BE SOLVED: To realize a shading characteristic which is excellent even at a module with a small ejection pupil diameter. PSOLUTION: Wiring and an interlayer insulating film are laminated on a semiconductor substrate where a pixel allay is installed. When an insulating film (protection film) on the uppermost layer is to be formed, a curve face in a three-dimensional curve shape dented on the center side of the pixel array is formed on the upper face of the uppermost layer. An on-chip micro lens is formed along the curve face. Thus, a distance between each pixel of the pixel array and the on-chip micro lens is made to be small on the center side of the pixel array, and to be large on the peripheral side of the pixel array. A pupil in a three-dimensional direction is corrected. In the forming method of the curve face, the curve face can be formed, for example, by using a difference of a polishing rate in a process for polishing the upper face of the upper layer film by a CMP method and flattening it. PCOPYRIGHT: (C)2006,JPO&NCIPI
机译:

要解决的问题:实现遮光特性,即使在具有较小出射光瞳直径的模块上也能实现出色的遮光特性。

解决方案:布线和层间绝缘膜层压在装有像素膜的半导体基板上。当要在最上层上形成绝缘膜(保护膜)时,在最上层的上表面上形成在像素阵列的中央侧凹陷的三维曲线形状的曲面。沿着曲面形成片上微透镜。因此,使得像素阵列的每个像素与芯片上微透镜之间的距离在像素阵列的中央侧较小,而在像素阵列的外围侧较大。校正三维方向上的瞳孔。在弯曲面的形成方法中,例如,可以在通过CMP法对上层膜的上表面进行平坦化的工序中利用研磨速度的差来形成弯曲面。

版权:(C)2006,JPO&NCIPI

著录项

  • 公开/公告号JP4622526B2

    专利类型

  • 公开/公告日2011-02-02

    原文格式PDF

  • 申请/专利权人 ソニー株式会社;

    申请/专利号JP20050003668

  • 发明设计人 星 博則;

    申请日2005-01-11

  • 分类号H01L27/14;H04N5/361;H04N5/369;

  • 国家 JP

  • 入库时间 2022-08-21 18:17:41

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