Thin-film magnetic head dimensions and array measurement method and thin-film magnetic head dimensions and array measuring device

摘要

PROBLEM TO BE SOLVED: To measure dimensional dispersion and positional deviation of a resistance detection element for polishing and a magnetic resistance effect (MR) element by illuminating the MR element and the resistance detection element formed on a substrate by light with a specific wavelength.;SOLUTION: A dimension and arrangement measuring device for an MR element and a resistance detection element is constructed of a measurement optical system 101, an automatic focus system 201, an image processing and controlling system 301, and a stage system 401. In the measurement optical system 101, an MR element and the resistance detection element for polishing formed on a substrate 1 by light with a wavelength on the order of 300 nm or less, desirably with a wavelength on the order of 200 nm, emitted from a light source 21 are illuminated. The reflection light from the elements is focussed on an image, which is converted into an image signal by photoelectric conversion. From the image signal, geometric information of the MR element and the resistance element for polishing is found. In this way, high precision measurement of various dimensions and an arrangement error of the minute MR element or the resistance detection element can be carried out while an end face protection film is applied.;COPYRIGHT: (C)2000,JPO