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Graphite nanofiber thin film formation for thermal CVD apparatus

机译:用于热CVD装置的石墨纳米纤维薄膜形成

摘要

PROBLEM TO BE SOLVED: To constitute a thermal CVD system for graphite nanofiber thin film deposition so that a gaseous mixture of carbon-containing gas and gaseous hydrogen for use in the thin film deposition process can be reused to decrease the consumption of a gaseous mixture of the carbon-containing gas and the gaseous hydrogen and the running cost of the system can be reduced. SOLUTION: An exhaust gas circulation means 21 is provided to a vacuum chamber 12 to which a gaseous mixture supply system 18 for introducing the gaseous mixture of the carbon-containing gas and the gaseous hydrogen into the vacuum chamber is connected. In this case, the exhaust gas circulation means is constituted so that H2O in the exhaust gas exhausted from the vacuum chamber can be trapped and the exhaust gas from which H2O is removed can be returned to the gaseous mixture supply system and reused.
机译:解决的问题:构成用于石墨纳米纤维薄膜沉积的热CVD系统,以便可以重复使用薄膜沉积过程中所用的含碳气体和氢气的气态混合物,以减少碳纳米管的气态混合物的消耗。可以减少含碳气体和气态氢,并降低系统的运行成本。解决方案:排气循环装置21设置在真空腔室12上,该腔室上连接有用于将含碳气体和气态氢的气体混合物引入真空腔室的气体混合物供应系统18。在这种情况下,构成排气循环装置,使得可以捕集从真空室排出的排气中的H 2 O,并且可以将去除了H 2 O的排气返回到气态混合物供应系统中并进行再利用。

著录项

  • 公开/公告号JP4677088B2

    专利类型

  • 公开/公告日2011-04-27

    原文格式PDF

  • 申请/专利权人 株式会社アルバック;

    申请/专利号JP20000313028

  • 发明设计人 古瀬 晴邦;阿川 義昭;深沢 博之;

    申请日2000-10-13

  • 分类号C23C16/44;B01J19/00;C01B31/02;C23C16/26;C23C16/46;D01F9/127;

  • 国家 JP

  • 入库时间 2022-08-21 18:17:19

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