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METHOD FOR CHARACTERISATION OF DIELECTRIC LAYERS BY ULTRAVIOLENT PHOTO-EMISSION SPECTROSCOPY

机译:超高压光发射光谱法表征介电层的方法

摘要

The electron affinity of thick dielectrics, of thickness greater than 10 nanometres, is measured by applying a polarisation voltage varying between −4V and −40V, for example, and by taking several measuring points to determine a reference value of the photo-emission threshold (ES), applying linear regression to an adjustment straight line (10) linking the measured thresholds (11) to the respective values of the square root of the voltage V.
机译:厚度大于10纳米的厚介电层的电子亲和力是通过施加例如介于-4V和-40V之间的极化电压,并采用多个测量点来确定光发射阈值的参考值来测量的( E S ),将线性回归应用于将测量的阈值( 11 )与相应的平方值相关联的调整直线( 10 )电压V的根。

著录项

  • 公开/公告号US2011233398A1

    专利类型

  • 公开/公告日2011-09-29

    原文格式PDF

  • 申请/专利权人 EUGENIE MARTINEZ;CYRIL GUEDJ;

    申请/专利号US200913063059

  • 发明设计人 CYRIL GUEDJ;EUGENIE MARTINEZ;

    申请日2009-09-15

  • 分类号G01N23/225;

  • 国家 US

  • 入库时间 2022-08-21 18:13:52

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