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METHOD FOR CHARACTERISATION OF DIELECTRIC LAYERS BY ULTRAVIOLENT PHOTO-EMISSION SPECTROSCOPY
METHOD FOR CHARACTERISATION OF DIELECTRIC LAYERS BY ULTRAVIOLENT PHOTO-EMISSION SPECTROSCOPY
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机译:超高压光发射光谱法表征介电层的方法
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摘要
The electron affinity of thick dielectrics, of thickness greater than 10 nanometres, is measured by applying a polarisation voltage varying between −4V and −40V, for example, and by taking several measuring points to determine a reference value of the photo-emission threshold (ES), applying linear regression to an adjustment straight line (10) linking the measured thresholds (11) to the respective values of the square root of the voltage V.
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机译:厚度大于10纳米的厚介电层的电子亲和力是通过施加例如介于-4V和-40V之间的极化电压,并采用多个测量点来确定光发射阈值的参考值来测量的( E S Sub>),将线性回归应用于将测量的阈值( 11 B>)与相应的平方值相关联的调整直线( 10 B>)电压V的根。
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