首页> 外国专利> METHOD AND APPARATUS FOR MAKING A HIGHLY UNIFORM LOW-STRESS SINGLE CRYSTAL BY DRAWING FROM A MELT AND USES OF SAID CRYSTAL

METHOD AND APPARATUS FOR MAKING A HIGHLY UNIFORM LOW-STRESS SINGLE CRYSTAL BY DRAWING FROM A MELT AND USES OF SAID CRYSTAL

机译:从熔体中拉制出高度均匀的低应力单晶的方法和装置以及使用的方法

摘要

The method of making uniform low-stress crystals includes immersing a seed crystal held at a temperature under its melting point in a melt in a crucible and drawing it from the melt. The crystal and/or melt are rotated relative to each other and a planar phase boundary surface is maintained between them by detecting a surface temperature of the melt and/or crystal and controlling temperature fluctuations by increasing or decreasing the rotation speed. A low-stress crystal of formula: (A1-xDx)3Al5O12 wherein 0x1, A=Lu and D=Pr and/or Ce, is preferred. These crystals have an index of refraction uniformity Δn of 1 ppm and a stress birefringence of 1 nm/cm at 193 nm, so that they are suitable for making optical elements for DUV lithography.
机译:制备均匀的低应力晶体的方法包括将保持在其熔点以下的温度的籽晶浸入坩埚中的熔体中并将其从熔体中拉出。晶体和/或熔体彼此相对旋转,并且通过检测熔体和/或晶体的表面温度并通过增加或减小旋转速度来控制温度波动,从而在它们之间保持平面相界面。一种低应力晶体,其分子式为:(A 1-x D x 3 Al 5 O 12 ,其中0

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