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Electronic design automation tool and method for optimizing the placement of process monitors in an integrated circuit
Electronic design automation tool and method for optimizing the placement of process monitors in an integrated circuit
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机译:电子设计自动化工具和方法,用于优化过程监视器在集成电路中的放置
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摘要
An electronic design automation (EDA) tool for and method of optimizing a placement of process monitors (PMs) in an integrated circuit (IC). In one embodiment, the EDA tool includes: (1) a critical path/cell identifier configured to identify critical paths and critical cells in the IC, (2) a candidate PM position identifier coupled to the critical path/cell identifier and configured to identify a set of candidate positions for the PMs, (3) a cluster generator coupled to the critical path/cell identifier and configured to associate the critical cells to form clusters thereof and (4) a PM placement optimizer coupled to the candidate PM position identifier and the cluster generator and configured to place a PM within each of the clusters by selecting among the candidate positions.
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