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Optimizing use and performance of optical systems implemented with telecentric on-axis dark field illumination

机译:优化使用远心同轴暗场照明实现的光学系统的使用和性能

摘要

Systems and methods are provided for imaging a planar specular object such as a semiconductor wafer. In one embodiment, an imaging system for imaging a defect on a planar specular object includes a telecentric lens having a sufficiently aspherical surface such that the telecentric lens is substantially corrected for an optical aberration. The imaging system also includes a telecentric stop including an aperture therein to block light reflected from the planar specular object while allowing light reflected from the defect to pass through the aperture. The imaging system further includes a lens group having a system stop positioned between the telecentric stop and the lens group. The lens group is substantially corrected for the optical aberration independent of the telecentric lens.
机译:提供了用于使诸如半导体晶片的平面镜面物体成像的系统和方法。在一个实施例中,一种用于对平面镜面物体上的缺陷进行成像的成像系统包括具有足够非球面表面的远心透镜,使得远心透镜的光学像差被基本校正。该成像系统还包括远心光阑,该远心光阑在其中包括孔,以阻挡从平面镜面物体反射的光,同时允许从缺陷反射的光穿过该孔。成像系统还包括具有系统挡块的透镜组,该系统挡块位于远心挡块和透镜组之间。独立于远心镜头,对透镜组进行了光学像差校正。

著录项

  • 公开/公告号US7929857B2

    专利类型

  • 公开/公告日2011-04-19

    原文格式PDF

  • 申请/专利权人 LEO BALDWIN;JOSEPH J. EMERY;

    申请/专利号US20090464475

  • 发明设计人 JOSEPH J. EMERY;LEO BALDWIN;

    申请日2009-05-12

  • 分类号G03B43/00;

  • 国家 US

  • 入库时间 2022-08-21 18:09:45

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