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Method, apparatus and system for designing an integrated circuit including generating at least one auxiliary pattern for cell-based optical proximity correction
Method, apparatus and system for designing an integrated circuit including generating at least one auxiliary pattern for cell-based optical proximity correction
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机译:用于设计集成电路的方法,装置和系统,包括产生至少一个辅助图案以用于基于单元的光学接近度校正
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摘要
Method and apparatus for designing an integrated circuit. A new layout is generated for at least one standard cell that incorporates an auxiliary pattern on a gate layer to facilitate cell-based optical proximity correction. An original placement solution is modified for a plurality of standard cells to permit incorporation of cells containing auxiliary patterns while improving an objective function of a resulting placement solution for the plurality of standard cells.
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