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High-index UV optical materials for immersion lithography
High-index UV optical materials for immersion lithography
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机译:高折射率紫外光学材料,用于浸没式光刻
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摘要
This invention is related to material for use as an ultraviolet (UV) optical element and particularly for use as a 193 nm immersion lens element. The material for use as a UV optical element includes a Lithium Magnesium Aluminate (LMAO) body. The specific compound for this application is the disordered lithium magnesium spinel, having the general composition of LixMg2(1−x)Al4+xO8 where x=0 to 1 as the high-index UV transparent material for immersion lithography. The LMAO body may include a disordered spinel, such as, for example, a single crystal that may be cubic in symmetry, optically isotropic, and having cation disorder within the structure to reduce the intrinsic birefringence (IBR). The LMAO body has certain desired material properties and may be readily made in relatively large sizes suitable for use as the UV optical element for photolithography.
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机译:本发明涉及用作紫外线(UV)光学元件,特别是用作193nm浸没透镜元件的材料。用作UV光学元件的材料包括铝酸锂镁(LMAO)主体。此应用的特定化合物是无序锂镁尖晶石,其一般成分为Li x Sub> Mg 2(1-x) Sub> Al 4 + x Sub> O 8 Sub>其中x = 0至1为用于浸没式光刻的高折射率UV透明材料。 LMAO体可以包括无序的尖晶石,例如单晶,其可以是对称的立方晶,光学各向同性的并且在结构内具有阳离子无序以减小固有双折射(IBR)。 LMAO主体具有某些所需的材料特性,并且可以容易地以适合用作光刻的UV光学元件的较大尺寸制造。
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