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Gas cluster ion beam emitting apparatus and method for ionization of gas cluster

机译：气体团簇离子束发射装置和用于气体团簇电离的方法

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摘要

An emitting apparatus 50 has a gas cluster generation chamber 2 and a nozzle 3 as means for generating a gas cluster and emitting the gas cluster to a processing object 10. A group of gas clusters jetted from the nozzle 3 is shaped into a gas cluster stream 8 in a beam form when passing through a skimmer 4. Electrons are emitted from an electron gun 12 to the gas cluster stream 8, whereby the gas cluster in the gas cluster stream is ionized.

机译：发射设备 50 具有气体团簇发生室 2 和喷嘴 3 ，作为用于产生气体团簇并将气体团簇发射到气体的装置。处理对象 10 。从喷嘴 3 喷出的一组气体团簇在通过撇渣器 4 时，以束的形式成形为气体团簇流 8 。电子从电子枪 12 发射到气体簇流 8 ，从而使气体簇流中的气体簇离子化。 展开▼

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公开/公告号US7855374B2

专利类型

公开/公告日2010-12-21

原文格式PDF

申请/专利权人 TETSURO SAITO;TATSUMI SHOJI;YOICHI FUKUMIYA;
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申请/专利号US20080044316

发明设计人 TETSURO SAITO;TATSUMI SHOJI;YOICHI FUKUMIYA;
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申请日2008-03-07

分类号H01J27/00;

国家 US

入库时间 2022-08-21 18:08:28

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