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MEEF reduction by elongation of square shapes
MEEF reduction by elongation of square shapes
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机译:通过延长矩形来减少MEEF
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摘要
A method that purposely relaxes OPC algorithm constraints to allow post OPC mask shapes to elongate along one direction (particularly lowering the 1-dimensional MEEF in this direction with the result of an effectively overall lowered MEEF) to produce a pattern on wafer that is circular to within an acceptable tolerance.
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