首页> 外国专利> Heterocycloalkyl-substituted naphthalene-based tetracarboxylic diimide compounds as N-type semiconductor materials for thin film transistors

Heterocycloalkyl-substituted naphthalene-based tetracarboxylic diimide compounds as N-type semiconductor materials for thin film transistors

机译:杂环烷基取代的萘基四羧酸二酰亚胺化合物作为薄膜晶体管的N型半导体材料

摘要

A thin film transistor comprises a layer of organic semiconductor material comprising a tetracarboxylic diimide naphthalene-based compound having, attached to one or both of the imide nitrogen atoms, a substituted or unsubstituted heterocycloalkyl ring system. Such transistors can further comprise spaced apart first and second contacts or electrodes in contact with said material. Further disclosed is a process for fabricating an organic thin-film transistor device, preferably by sublimation deposition onto a substrate, wherein the substrate temperature is no more than 200° C.
机译:薄膜晶体管包括有机半导体材料层,该有机半导体材料层包括基于四羧酸二酰亚胺萘的化合物,该化合物具有连接至两个或两个酰亚胺氮原子上的取代或未取代的杂环烷基环系。这样的晶体管可以进一步包括与所述材料接触的间隔开的第一和第二触点或电极。进一步公开了一种用于制造有机薄膜晶体管器件的方法,该方法优选地通过升华沉积到基板上,其中基板温度不超过200℃。

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号