An optical inspection system or tool can be configured to adjust the distribution of light by using one or more diffusers. The diffusers can be variable in some embodiments. For example, the angular or spatial distribution of the illumination can be adjusted to minimize intensity of illumination outside of an imaged area to thereby reduce illumination loss. The angular or spatial distribution may additionally or alternatively be adjusted so that the illumination across an illuminated area is substantially uniform. The use of one or more diffusers may aid in the inspection of semiconductor objects including, but not limited to, semiconductor wafers and the like.
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