首页> 外国专利> SEMICONDUCTOR SUBSTRATE TRANSFER / Treatment-TUNNEL ESTABLISHMENT WHICH IN ITS OPERATION IN MULTIPLE STRIP-SHAPED TOP SLOT-SECTIONS IT ABOVE THE SUCCESSIVE, UNINTERRUPTED BENEATH ALONG moving SEMICONDUCTOR SUBSTRATE-SECTIONS UNINTERRUPTED PLACE OF HEAT TREATMENT UNDER THEM OF VIBRATION CONDITION IN A PRECEDING PORTION THEREOF applied LAYER OF THE COMBINATION OF WEAR MEDIUM AND LIQUID MATTER OF SEMICONDUCTOR SUBSTANCE.

SEMICONDUCTOR SUBSTRATE TRANSFER / Treatment-TUNNEL ESTABLISHMENT WHICH IN ITS OPERATION IN MULTIPLE STRIP-SHAPED TOP SLOT-SECTIONS IT ABOVE THE SUCCESSIVE, UNINTERRUPTED BENEATH ALONG moving SEMICONDUCTOR SUBSTRATE-SECTIONS UNINTERRUPTED PLACE OF HEAT TREATMENT UNDER THEM OF VIBRATION CONDITION IN A PRECEDING PORTION THEREOF applied LAYER OF THE COMBINATION OF WEAR MEDIUM AND LIQUID MATTER OF SEMICONDUCTOR SUBSTANCE.

机译:在多个带状顶部插槽中运行的半导体基板传输/处理隧道的建立,在其连续移动的情况下,在不因上述问题而在整个环境中引起了干扰的情况下,在基板上连续移动了半导体基板磨损介质和半导体物质的液体物质结合的层。

摘要

机译:

著录项

  • 公开/公告号NL1037068C

    专利类型

  • 公开/公告日2010-12-27

    原文格式PDF

  • 申请/专利权人 BOK EDWARD;

    申请/专利号NL20091037068

  • 发明设计人 BOK EDWARD;

    申请日2009-06-23

  • 分类号H01L21/677;

  • 国家 NL

  • 入库时间 2022-08-21 18:05:14

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