首页> 外国专利> POLYMERIC PARTICLE ABSORBING IN NEAR INFRARED BAND, METHOD OF MANUFACTURE THEREOF, COATING COMPOSITION AND NEGATIVE-WORKING LITHOGRAPHIC PRINTING PLATE

POLYMERIC PARTICLE ABSORBING IN NEAR INFRARED BAND, METHOD OF MANUFACTURE THEREOF, COATING COMPOSITION AND NEGATIVE-WORKING LITHOGRAPHIC PRINTING PLATE

机译:红外波段附近的聚合物颗粒吸收,其制造方法,涂层成分和负性制版印刷板

摘要

There is provided polymeric particles having a particle size between about 60 nm and about 1000 nm and comprising a polymer, the polymer comprising a hydrophobic backbone, a near infrared absorbing segment having attached thereto a near infrared absorbing chromophore having an absorption peak between about 700 nm and about 1100 nm; and a near infrared transparent segment. Method of manufacture these particles are also provided. A coating composition comprising the above-polymeric particles and a reactive iodonium oligomer is also provided. Finally, a negative-working lithographic offset printing plate comprising a substrate; a hydrophilic under layer; and a laser imageable upper layer, wherein the laser imageable upper layer comprises the above polymeric particle is also provided.
机译:提供了粒度在约60nm至约1000nm之间并包含聚合物的聚合物颗粒,所述聚合物包含疏水性主链,连接有近红外吸收发色团的近红外吸收发色团,其吸收峰在约700nm之间约1100 nm;和近红外透明段。还提供了制造这些颗粒的方法。还提供了包含上述聚合物颗粒和反应性碘鎓低聚物的涂料组合物。最后,一种负性平版胶版印刷版,其包括基底;亲水底层激光可成像上层,其中还提供了包含上述聚合物颗粒的激光可成像上层。

著录项

  • 公开/公告号UA93261C2

    专利类型

  • 公开/公告日2011-01-25

    原文格式PDF

  • 申请/专利权人 AMERICAN DYE SOURCE INC.;

    申请/专利号UAA200901183

  • 发明设计人 NGUYEN MY T.;LOCAS MARC ANDRE;

    申请日2007-08-10

  • 分类号C08F220;B41C1;B41N1;C08F212;C08J3;C08J3/24;C08J7;C09D5/32;C09D133;

  • 国家 UA

  • 入库时间 2022-08-21 18:04:23

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