首页> 外国专利> METHOD OF PLATING ON A GLASS BASE PLATE, A METHOD OF MANUFACTURING A DISK SUBSTRATE FOR A PERPENDICULAR MAGNETIC RECORDING MEDIUM, A DISK SUBSTRATE FOR A PERPENDICULAR MAGNETIC RECORDING MEDIUM, AND APERPENDICULAR MAGNETIC RECORDING MEDIUM

METHOD OF PLATING ON A GLASS BASE PLATE, A METHOD OF MANUFACTURING A DISK SUBSTRATE FOR A PERPENDICULAR MAGNETIC RECORDING MEDIUM, A DISK SUBSTRATE FOR A PERPENDICULAR MAGNETIC RECORDING MEDIUM, AND APERPENDICULAR MAGNETIC RECORDING MEDIUM

机译:放置在玻璃基板上的方法,制造用于垂直磁记录介质的磁盘基体,用于垂直磁记录介质的磁盘基体和垂直磁记录介质的方法

摘要

AN OBJECT OF THE PRESENT INVENTION IS TO PROVIDE A PLATING METHOD ON A GLASS BASE PLATE. THE METHOD ALLOWS A PLATING FILM TO BE FORMED 5 ON A BASE PLATE COMPOSED OF A GLASS MATERIAL WITH EXCELLENT ADHESIVITY AND HOMOGENEITY BY MEANS OF AN ELECTROLESS PLATING METHOD EVEN TO A THICKNESS OF 1 PM OR MORE. BEFORE FORMING A PLATING FILM BY A STEP OF ELECTROLESS PLATING S8, A SERIES OF SURFACE TREATMENTS ARE CONDUCTED ON THE SURFACE OF THE BASE PLATE COMPOSED OF A GLASS MATERIAL. THE SURFACE TREATMENTS CO MPRISES AT LEAST A STEP OF GLASS ACTIVATION TREATMENT S2, A STEP OF SILANE COUPLING AGENT TREATMENT S3, A STEP OF PALLADIUM CATALYST TREATMENT S4, AND A STEP OF PALLADIUM BONDING TREATMENT S5, A STEP OF ELECTROLESS PLATING S6 TO FORM A PRELIMINARY PLATING FILM HAVING A THICKNESS IN THE RANGE OF 0.02 UM TO 0.5 UM, AND A STEP OF ANNEALING S7 AT A TEMPERATURE IN THE RANGE OF 200'C TO 350'C. SELECTED DRAWING IS FIG. 1.
机译:本发明的目的是提供一种在玻璃基板上的镀覆方法。该方法允许在厚度为1 PM或更高的无电电镀方法的基础上,在由具有出色吸湿性和均质性的玻璃材料组成的基板上形成镀膜。在通过化学镀步骤S8形成镀膜之前,在由玻璃材料构成的基板的表面上进行一系列的表面处理。表面处理包括至少一个玻璃活化处理S2,一个硅烷偶联剂处理S3,一个钯催化剂处理S4,一个与钯结合的处理S5,一个将电镀S6电镀到步骤S5的步骤。初步镀膜的厚度在0.02 um至0.5 um的范围内,并在200'C至350'C的温度下对S7进行退火。选择的图是图。 1。

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