Deposition apparatus PEVCD an internal barrier layer in a container comprising a device for optical analysis of plasma.

摘要

Apparatus (1) for plasma deposition activated vapor phase (PECVD) of a thin layer of a barrier material on an internal wall (2) of a container (3), the apparatus comprising (1): - A structure (5,6,8,11) receiving the receptacle (3) and a zone (9,18) of the presence of plasma, this structure (5,6,8,11) crossed by a tube (14) being that it comprises an axis (A1), and having an internal opening (15) opening into the area (18) of the presence of plasma defined by the inner volume of the container (3) and an outer opening (16) opening outside this area (18) defined by the inner volume of the container (3); - An electromagnetic wave generator for activating the plasma; and - a device (19) of optical control plasma, comprising a spectrometer (20) and a sensor (21) positioned outside of the area (9.18) plasma-presence and connected to the spectrometer (20); I apparatus characterized in that said sensor (21) is positioned on the axis (A1) of said tube (14), so that is in direct optical contact with the area (18) of the presence of the plasma defined by the internal volume of the container (3).