APPARATUS FOR THE PECVD DEPOSITION OF AN INNER BARRIER LAYER ON A CONTAINER, COMPRISING AN OPTICAL PLASMA ANALYSIS DEVICE

摘要

The invention relates to an apparatus (1) for the PECVD deposition of a thin layer of a material having a barrier effect in a container (3), comprising: a housing (5) for the container (3), which defines a plasma zone (18) and which is equipped with a hole (14) defining an axis (A1) and having an inner opening (15) which opens into the plasma zone (18) and an outer opening (16) which opens outside said zone (18); an electromagnetic wave generator; and an optical plasma control device (19) comprising a sensor (21) which is placed outside the plasma zone (18) in the axis (A1) of the hole (14).