首页> 外国专利> STRAIN MATCHING OF CRYSTALS AND HORIZONTALLY-SPACED MONOCHROMATOR AND ANALYZER CRYSTAL ARRAYS IN DIFFRACTION ENHANCED IMAGING SYSTEMS AND RELATED METHODS

STRAIN MATCHING OF CRYSTALS AND HORIZONTALLY-SPACED MONOCHROMATOR AND ANALYZER CRYSTAL ARRAYS IN DIFFRACTION ENHANCED IMAGING SYSTEMS AND RELATED METHODS

机译:衍射增强成像系统中晶体和水平空间型单色仪和分析仪晶体阵列的应变匹配及相关方法

摘要

Strain matching of crystals and horizontally-spaced monochromator and analyzercrystal arrays in diffractionenhanced imaging systems and related methods are disclosed. A DEI system,including strain matched crystals can comprise anX--ray source configured to generate a first X-ray beam. A first monochromatorcrystal can be positioned to intercept the first X-raybeam for producing a second X-ray beam. A second monochromator crystal can bepositioned to intercept the second X-ray beamto produce a third X-ray beam for transmission through an object. The secondmonochromator crystal has a thickness selectedsuch that a mechanical strain on a side of the first monochromator crystal isthe same as a mechanical strain on the secondmonochromator crystal. An analyzer crystal has a thickness selected such thata mechanical strain on a side of the firstmonochromator crystal is the same as a mechanical strain on the analyzercrystal.
机译:晶体的应变匹配以及水平分布的单色仪和分析仪衍射中的晶体阵列公开了增强的成像系统和相关方法。 DEI系统包括应变匹配的晶体可以包括X射线源,配置为生成第一条X射线束。第一台单色仪可以定位晶体以拦截第一个X射线用于产生第二X射线束的光束。第二个单色器晶体可以是定位为拦截第二个X射线束产生第三条X射线束,以透过物体。第二单色仪晶体的厚度已选定这样第一单色仪晶体一侧的机械应变为与第二个上的机械应变相同单色器晶体。分析器晶体的厚度选择为第一个侧面的机械应变单色仪晶体与分析仪上的机械应变相同水晶。

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