首页> 外国专利> STRAIN MATCHING OF CRYSTALS AND HORIZONTALLY-SPACED MONOCHROMATOR AND ANALYZER CRYSTAL ARRAYS IN DIFFRACTION ENHANCED IMAGING SYSTEMS AND RELATED METHODS

STRAIN MATCHING OF CRYSTALS AND HORIZONTALLY-SPACED MONOCHROMATOR AND ANALYZER CRYSTAL ARRAYS IN DIFFRACTION ENHANCED IMAGING SYSTEMS AND RELATED METHODS

机译:衍射增强成像系统中晶体和水平空间型单色仪和分析仪晶体阵列的应变匹配及相关方法

摘要

Strain matching of crystals and horizontally-spaced monochromator and analyzer crystal arrays in diffraction enhanced imaging systems and related methods are disclosed. A DEI system, including strain matched crystals can comprise an X-ray source configured to generate a first X-ray beam. A first monochromator crystal can be positioned to intercept the first X-ray beam for producing a second X-ray beam. A second monochromator crystal can be positioned to intercept the second X-ray beam to produce a third X-ray beam for transmission through an object. The second monochromator crystal has a thickness selected such that a mechanical strain on a side of the first monochromator crystal is the same as a mechanical strain on the second monochromator crystal. An analyzer crystal has a thickness selected such that a mechanical strain on a side of the first monochromator crystal is the same as a mechanical strain on the analyzer crystal.
机译:公开了衍射增强成像系统中的晶体与水平间隔的单色仪和分析器晶体阵列的应变匹配以及相关方法。包括应变匹配晶体的DEI系统可以包括被配置为产生第一X射线束的X射线源。可以放置第一单色仪晶体以拦截第一X射线束以产生第二X射线束。可以放置第二单色器晶体以拦截第二X射线束,以产生第三X射线束,以透射通过物体。第二单色仪晶体的厚度被选择为使得第一单色仪晶体的侧面上的机械应变与第二单色仪晶体上的机械应变相同。分析器晶体的厚度被选择为使得第一单色仪晶体的一侧上的机械应变与分析器晶体上的机械应变相同。

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