首页> 外国专利> ELECTRON BEAM APPLICATION METHOD, ELECTRON BEAM APPLICATION DEVICE, ELECTRON BEAM APPLICATION DEVICE FOR OPENING-EQUIPPED VESSEL

ELECTRON BEAM APPLICATION METHOD, ELECTRON BEAM APPLICATION DEVICE, ELECTRON BEAM APPLICATION DEVICE FOR OPENING-EQUIPPED VESSEL

机译:电子束施加方法,电子束施加装置,用于装备有开口的容器的电子束施加装置

摘要

There are provided an electron beam application method and an electron beam application device capable of uniformly applying electron beams to an object even if the electron beams have a low energy. For this, electron beams (EB) are applied to a beverage container (30) (object) within a magnetic barrier (MF) formed by combining a plurality of magnetic fields generated in an electron beam application region.
机译:提供了一种电子束施加方法和电子束施加装置,即使该电子束具有低能量,该电子束施加方法和电子束施加装置也能够均匀地将电子束施加到物体。为此,将电子束(EB)施加到通过结合在电子束施加区域中产生的多个磁场而形成的磁障(MF)内的饮料容器(30)(物体)。

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号