SOLAR CELL FABRICATION BY NANOIMPRINT LITHOGRAPHY

摘要

Fabricating a solar cell stack includes forming a nanopattemed polymeric layer on a first surface of a silicon wafer and etching the first surface of the silicon wafer to transfer a pattern of the nanopattemed polymeric layer to the first surface of the silicon wafer. A layer of reflective electrode material is formed on a second surface of the silicon wafer. The nanopattemed first surface of the silicon wafer undergoes a buffered oxide etching. After the buffered oxide etching, the nanopattemed first surface of the silicon wafer is treated to decrease a contact angle of water on the nanopattemed first surface. Electron donor material is deposited on the nanopattemed first surface of the silicon wafer to form an electron donor layer, and a transparent electrode material is deposited on the electron donor layer to form a transparent electrode layer on the electron donor layer.