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TERAHERTZ RADIATION ANALYSIS DEVICE AND METHOD OF ANALYZING TERAHERTZ RADIATION

机译:TERAHERTZ辐射分析装置和分析TERAHERTZ辐射的方法

摘要

Provided is a method of analyzing terahertz radiation capable of deriving the physical properties of materials for a semiconductor without using special additional facilities. In the method of analyzing terahertz radiation, pulse light is irradiated onto a sample when a magnetic field is being applied, and time waveforms (Rsp, Rpp) of reflected waves reflected from the sample are detected (S6 to S7, S9 to S10). Also, pulse light is irradiated onto the sample when no magnetic field is being applied, and time waveforms (Rp, Rs) of reflected waves reflected from the sample are detected (S1 to S2, S3 to S4). Further, based on the time waveforms (Rp, Rs, Rsp, Rpp) the diagonal component (εxx) and the non-diagonal component (εxy) of a complex permittivity tensor are derived when a magnetic field is being applied to the sample (S5, S8, S11 to S12). Thereby, the physical properties of materials for a sample are derived (S13), which includes the diagonal component (εxx) and the non-diagonal component (εxy) as parameters.
机译:提供了一种分析太赫兹辐射的方法,该方法能够导出半导体材料的物理特性,而无需使用特殊的附加设施。在太赫兹辐射的分析方法中,当施加磁场时,脉冲光会照射到样品上,并且反射波的时间波形(R sp ,R pp )从样品反射的光被检测到(S6至S7,S9至S10)。另外,在不施加磁场的情况下,将脉冲光照射到样品上,并且检测从样品反射的反射波的时间波形(R p ,R s ) (S1至S2,S3至S4)。此外,基于时间波形(R p ,R s ,R sp ,R pp ),对角线当磁场施加到样品上时,复介电常数张量的分量(ε xx )和非对角分量(ε xy )被推导(S5,S8 ,S11至S12)。从而,获得用于样本的材料的物理特性(S13),其中包括对角线分量(ε xx )和非对角线分量(ε xy )。参数。

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