首页> 外国专利> METALLIZATION PROCESS TO OBTAIN A MICROELECTRODE ON A PHOTOPATTERNABLE SUBSTRATE AND ITS BIOMEDICAL APPLICATION ON AN ORGAN TRANSPLANT MONITORING DEVICE

METALLIZATION PROCESS TO OBTAIN A MICROELECTRODE ON A PHOTOPATTERNABLE SUBSTRATE AND ITS BIOMEDICAL APPLICATION ON AN ORGAN TRANSPLANT MONITORING DEVICE

机译:在可光降解基质上获得微电极的金属化过程及其在有机移植监测装置中的生物医学应用

摘要

Metallization process to obtain a microelectrode on a photopatternable polymeric substrate comprising the steps of depositing a material withlow adhesion, spin coating a negative photoresin A, Patterning its design,, protecting its uncured areas, depositing apositive photoresin B, and etch awaythem, Patterning the electrode using photolithography, metallizing the resulting surface, Etching away the positive photoresin polymers B and B', spin-coating a negative photoresin A and finally performing the final development, hence overcoming the state of the art difficulties providing a process for obtaining a photopatterned polymeric substrate microelectrode, with the ductility required to prevent the microelectrode from breaking and the thickness required to avoid folding during the insertion.
机译:在可光图案化的聚合物基板上获得微电极的金属化工艺,该步骤包括以下步骤:沉积低粘附力的材料,旋涂负性光树脂A,对其设计进行图案化,保护其未固化区域,沉积正性光树脂B并蚀刻掉它们,对电极进行图案化使用光刻法,对所得表面进行金属化,蚀刻掉正性光树脂聚合物B和B',旋涂负性光树脂A,最后进行最终显影,因此克服了现有技术的困难,提供了一种获得光致图案化的聚合物基材的方法微电极,具有防止微电极破裂所需的延展性和避免在插入过程中折叠所需的厚度。

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