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SURFACE TREATMENT MASK, PROCESS FOR PRODUCING THE SURFACE TREATMENT MASK, METHOD FOR SURFACE TREATMENT, PARTICLE-CONTAINING FILM, AND PROCESS FOR PRODUCING THE PARTICLE-CONTAINING FILM
SURFACE TREATMENT MASK, PROCESS FOR PRODUCING THE SURFACE TREATMENT MASK, METHOD FOR SURFACE TREATMENT, PARTICLE-CONTAINING FILM, AND PROCESS FOR PRODUCING THE PARTICLE-CONTAINING FILM
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机译:表面处理用面膜,表面处理用面膜的制造方法,表面处理方法,含颗粒膜,以及含颗粒膜的制造方法
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摘要
This invention provides a surface processing mask having a film mask and a method for manufacturing the same. In the film mask, particles are present as a single layer without overlapping with each other or particles containing first particles and second particles having etching resistance lower than that of the first particles are contained. Moreover, the invention provides a surface processing method including disposing the film mask on the front surface of a process target, and etching the front surface to form irregularities and an optical device having a substrate processed by the surface processing method. Moreover, the invention provides a particle-containing film in which particles are arranged to form a single layer without overlapping with each other and a method for manufacturing the same.
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