PLASMA PROCESSING APPARATUS HAVING A DIFFUSION PUMP, CAPABLE OF PROCESSING PLASMA THROUGH SMART CONTROL OF A DIFFUSION PUMP

摘要

PURPOSE: A plasma processing apparatus having a diffusion pump is provided to reduce maintenance costs by applying a diffusion pump to reduce a mechanical failure rate.;CONSTITUTION: A vacuum chamber(10) is connected to a gas supply part(30) and an exhausting unit(40). A chuck(210) and a plasma generation electrode(220) are arranged in the vacuum chamber. A high-frequency bias power supply unit(240) is connected with the chuck. An RF inductively coupled plasma antenna(230) is arranged outside the vacuum chamber. A high-frequency bias power supply unit(250) is connected to one end of the RF antenna.;COPYRIGHT KIPO 2011