WATER-REPELLANT COMPOSITION FOR SUBSTRATE TO BE EXPOSED, METHOD OF FORMING RESIST PATTERN, ELECTRONIC DEVICE PRODUCED BY THE FORMATION METHOD, METHOD OF IMPARTING WATER REPELLENCY TO SUBSTRATE TO BE EXPOSED, WATER-REPELLANT SET FOR SUBSTRATE TO BE EXPOSED, AND METHOD OF IMPARTING WATER REPELLENCY WITH THE SAME TO SUBSTRATE TO BE EXPOSED

摘要

The invention, together with pollution suppressed if the amount of an exposed substrate by immersion, the blood membrane and the film separation can be suppressed to improve the adhesion between the organic layer and just above, for the high water-repellent action on an exposed substrate St. agent composition, a resist pattern forming method and an electronic device produced by the formation method, an exposed substrate the water repellent treatment, an exposed substrate for providing the water repellent treatment of the water-repellent agent and an exposed substrate using the same set. To at least a water-repellent agent composition for use on an exposed substrate and a solvent containing an organic silicon compound represented by the formula (1). However, R ¹ is a monovalent organic group having from 14 to 30, R ² , R ³ , R ⁴ are each a monovalent organic group or a hydrolyzable group independently having 1 to 10, R ² , R ³ , R ⁴ of at least one is a hydrolyzable group. R & 1 & ;