METHOD OF INVESTIGATING OPEN OF SECOND CR LAYER IN PHASE SHIFT MASK

摘要

PURPOSE: A testing method of a secondary chrome layer of a phase shift mask is provided to determine data errors caused by a user and to test the second opening of a chrome layer without using a specific testing device. CONSTITUTION: A testing method of a secondary chrome layer of a phase shift mask comprises the following steps: preparing a first image marking a chrome layer open area of the phase shift mask, based on data input by a user, using an exposure device(110); preparing a second image marked with a chrome layer open area of the phase shift mask based on design data(120); displaying an overlapping image formed by the first and second images(130); and testing the second opening of the chrome layer and a data error(140).