CLEANING APPARATUS FOR ELIMINATING SLURRY, CAPABLE OF MINIMIZING THE USAGE OF WATER BY MANUFACTURING AN OVERFLOW TYPE RINSE CLEANING BATH

摘要

PURPOSE: A cleaning apparatus for eliminating slurry is provided to maximize cleaning effect by simultaneously implementing a chemically cleaning process and a physically cleaning process in one cleaning bath.;CONSTITUTION: A sliced silicon wafer and a beam on which the slice wafer is arranged are fixed to a basket. The cleaning bath(2) eliminates slurry on the sliced silicon wafer using a spraying technique. A robot(3) moves a basket. The sliced silicon wafer and the beam are separated using chemical at high temperature in the cleaning bath. A rinse cleaning bath is composed of an overflow type.;COPYRIGHT KIPO 2011