首页> 外国专利> RESIST STRIPPER COMPSOITION CONTAINING BASIC COMPOUND OF SPECIAL STRUCTURE, SPECIAL AMIDE COMPOUND, POLAR SOLVENT, AND SPECIAL POLYOL COMPOUND

RESIST STRIPPER COMPSOITION CONTAINING BASIC COMPOUND OF SPECIAL STRUCTURE, SPECIAL AMIDE COMPOUND, POLAR SOLVENT, AND SPECIAL POLYOL COMPOUND

机译:包含特殊结构的基本化合物,特殊酰胺化合物,极性溶剂和特殊多元醇化合物的抗剥离剂组合物

摘要

PURPOSE: A resist stripper composition is provided to ensure excellent residual removing ability and to excellently prevent corrosion of metal wire.;CONSTITUTION: A resist stripper composition contains: basic compound containing one or more selected from a compound denoted by chemical formulas 1-3; an amide compound of chemical formula 4; a polar solvent; and a polyol compound of chemical formula 5. In chemical formulas 1-5, R1, R2, R3, R4, R5, and R6 are independently hydrogen, amino group-substituted or non-substituted alkyl group of 1-10 carbon atoms, alkenyl group of 2-10 carbon atoms, hydroxyalkyl group of 1-10 carbon atoms, carboxyl group, alkyl group-substituted or non-substituted amino group of 1-4 carbon atoms, phenyl group, or benzyl group.;COPYRIGHT KIPO 2011
机译:用途:提供抗蚀剂剥离剂组合物以确保优异的残留去除能力并优异地防止金属线的腐蚀。组成:抗蚀剂剥离剂组合物包含:碱性化合物,其包含一种或多种选自化学式1-3表示的化合物;化学式4的酰胺化合物;极性溶剂;和化学式1-5的多元醇化合物。在化学式1-5中,R 1,R 2,R 3,R 4,R 5和R 6独立地是氢,1-10个碳原子的氨基取代的或未取代的烷基,烯基。 2-10个碳原子的基团,1-10个碳原子的羟烷基,羧基,1-4个碳原子的烷基取代或未取代的氨基,苯基或苄基。; COPYRIGHT KIPO 2011

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