SELECTIVE ASSEMBLED METHOD OF NANO-MATERIALS BY USING ONLY PHOTOLITHOGRAPHY AND A FABRICATION METHOD OF A NANO-STRUCTURE MULTICHANNEL FET DEVICES USING THEREOF

摘要

PURPOSE: A selective assembled method of nano-materials by using only photolithography and a fabrication method of a nano-structure multichannel FET devices using thereof are provided to reduce a process step by enabling nano particles to be attached to a substrate through a photolithography and a solution process.;CONSTITUTION: In a selective assembled method of nano-materials by using only photolithography and a fabrication method of a nano-structure multichannel FET devices using thereof, an oxide film(SiO2) is formed on a silicon substrate. A random PR pattern is formed on the oxide film through the photo lithography process(S110). A nano-material is absorbed to the surface of a sample through a solution process(S120). A photoresist pattern on the surface of the sample having the nano particles is removed(S130). A multichannel FET device is manufactured by using selectively patterned nano-material.;COPYRIGHT KIPO 2011