METHOD FOR MANUFACTURING A MASK HAVING SUBMILLIMETRIC APERTURES FOR A SUBMILLIMETRIC ELECTRICALLY CONDUCTIVE GRID, MASK HAVING SUBMILLIMETRIC APERTURES, AND SUBMILLIMETRIC ELECTRICALLY CONDUCTIVE GRID

摘要

The present invention relates to a method of manufacturing a mask (1) having an opening (10) of the sub-millimeter, - depositing the solution of the stabilized colloidal nanoparticles dispersed in a solvent in the mask layer, the particles are given a glass transition temperature have a (T _g); - A mask layer, is until a so-called mask having a two dimensional array of substantially one millimeter sub opening having a straight edge of the mask area in the mask area array and dried at a temperature less than the temperature (T _g); - A mask-free area on the surface is formed through mechanical and / or optical contraction of one or more of the peripheral portion of the mask area array. The invention also relates to a grid having an array of the mask (1) and thus the electrically conductive area that is generated along the solid. ;