CRYSTALLIZING MASK AND CRYSTALLIZATION METHOD USING THE SAME, CAPABLE OF IMPROVING CRYSTALLIZATION CHARACTERISTICS

摘要

PURPOSE: A crystallizing mask and a crystallization method using the same are provided to remove grain boundary by changing mask shape without an additional process. ;CONSTITUTION: An amorphous silicon layer is deposited on a substrate. A crystallizing mask(100) is aligned on the amorphous silicon layer. The crystallizing mask comprises a plurality of transmission parts(110) and a semi-transmission part(120) among them. The crystallization mask or the substrate is moved so that different regions of the crystallizing mask correspond to the same part on the amorphous silicon layer. Crystallization is performed by irradiating a laser beam.;COPYRIGHT KIPO 2011