COMPOSITION FOR A RESIST SUB-LAYER, A METHOD FOR MANUFACTURING A SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE USING THE SAME, AND THE SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE MANUFACTURED BY THE SAME CAPABLE OF OBTAINING THE ANTI-REFLECTION CHARACTERISTIC BY INCLUDING SPECIFIC ORGANIC SILANE-BASED POLYCONDENSATE AND A SOLVENT

摘要

PURPOSE: A composition for a resist sub-layer, a method for manufacturing a semiconductor integrated circuit device using the same, and the semiconductor integrated circuit device manufactured by the same are provided to control the refractive index and the absorbance in a wavelength range which is lower than or equal to 250nm. ;CONSTITUTION: A composition for a resist sub-layer includes organic silane-based polycondensate and a solvent. The organic silane-based polycondensate is generated from a group represented by chemical formulas 1 or 2 under acidic catalyst and alkaline catalyst. In the chemical formulas, the R1 is halogen, hydroxyl group, alkoxy group, carboxylic group, ester group, cyano group, haloalkyl sulfite group, alkylamine group, alkylsilyl amine group, or alkylsilyloxy group. The Ar1 is substituted or non-substituted C6 to C12 arylene group. The Ar2 and the Ar3 are identical or different and substituted or non-substituted C6 to C12 aryl group. The m and the n are identical or different and are respectively 0 or the integer of 1 to 5.;COPYRIGHT KIPO 2011