首页> 外国专利> BONDING MATERIAL FOR A SPUTTERING TARGET TO ATTACH A SPUTTERING TARGET MATERIAL AND A SUPPORTING MATERIAL AND A SPUTTERING TARGET USING THE SAME

BONDING MATERIAL FOR A SPUTTERING TARGET TO ATTACH A SPUTTERING TARGET MATERIAL AND A SUPPORTING MATERIAL AND A SPUTTERING TARGET USING THE SAME

机译:溅射靶材的粘结材料与溅射靶材的结合以及使用该靶材的支撑材料和溅射靶材的结合

摘要

PURPOSE: A bonding material for a sputtering target and a sputtering target using the same are provided to prevent crack of a sputtering target material when attaching the sputtering target material to a supporting material and the bending of the supporting material caused by heating. ;CONSTITUTION: A sputtering target comprises a supporting material(11), a sputtering target material(12), and a bonding material(13). The supporting material is formed in a cylindrical shape. The sputtering target material is attached to the supporting material by the bonding material to form a thin film. The bonding material is formed by mixing tin metal and indium metal, where the content of the tin metal is 48~50 weight% and the melting point is 120~125°C.;COPYRIGHT KIPO 2011
机译:目的:提供用于溅射靶的结合材料和使用该靶的溅射靶,以防止在将溅射靶材料附着到支撑材料上时溅射靶材料的破裂以及由加热引起的支撑材料的弯曲。 ;组成:溅射靶包括支撑材料(11),溅射靶材料(12)和结合材料(13)。支撑材料形成为圆柱形。通过结合材料将溅射靶材料附着到支撑材料上以形成薄膜。结合材料是通过将锡金属和铟金属混合而形成的,其中锡金属的含量为48〜50重量%,熔点为120〜125℃。COPYRIGHTKIPO 2011

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号